HERALD promotes European research activity in Atomic Layer Deposition (ALD)

HERALD (COST action MP1402) aims to structure and integrate European research activity in atomic layer deposition (ALD), bringing together existing groups, promoting young scientists and reaching out to industry and the public.  ALD is a unique technique for growing ultra-thin films that is enabling new developments in high-tech manufacturing sectors such as electronics, energy and coatings. With interest growing worldwide, the time is right to coordinate European activity in this field.  HERALD supports collaboration through lab visits, workshops and training schools.


Novel High k Application Workshop 2017

NaMLab invites to the Novel High-k Application Workshop on March 9th and 10th, 2017. New challenges offered by the application of ALD based high-k dielectric materials in micro– and nanoelectronics...Read more

Call for HERALD workshops

We are now planning HERALD activities for the period May 2017 - April 2018.  If you would like to propose an activity such as a workshop, conference or training school,...Read more

Next Event

20 Apr 2017 to 21 Apr 2017
Eindhoven University & Hotel Pullman Cocagne Eindhoven
Eindhoven, NL

Join this Action

If you would like to join COST Action MP1402, please send an email to the HERALD Chair.

Further details on joining COST actions can be found on our How to Join page.

Working Groups

To elucidate ALD mechanisms through metrology, especially in situ measurements, and through modeling of growth chemistry.

Joint publications:





Workshops for this WG:...

To synthesise new chemical precursors and use them in thin film deposition experiments to find viable ALD processes for materials where no process exists at present.

Joint publications:


To achieve control of interfaces through ALD, understanding nucleation, depositing onto 2D materials and developing new approaches to selective-area ALD.

Joint publications:



Workshops for this WG:...

To develop and integrate ALD processes for oxides, sulfides and nitrides for applications in transparent electronics, memristors, light emitting devices and nanosensors, in collaboration with industry.

Joint Publications:


To develop processes for the molecular layer deposition (MLD) of hybrid organic/inorganic films, along with optimization of material properties.

Workshops for this WG: