HERALD promotes European research activity in Atomic Layer Deposition (ALD)

HERALD (COST action MP1402) aims to structure and integrate European research activity in atomic layer deposition (ALD), bringing together existing groups, promoting young scientists and reaching out to industry and the public.  ALD is a unique technique for growing ultra-thin films that is enabling new developments in high-tech manufacturing sectors such as electronics, energy and coatings. With interest growing worldwide, the time is right to coordinate European activity in this field.  HERALD supports collaboration through lab visits, workshops and training schools.

News

Call for STSMs until March 2017

A rolling call is now open for funding contributions for Short Term Scientific Missions in the HERALD Cost Action MP1402.  All researchers are welcome to apply, but those within 8...Read more

Next Event

Training School
2 Jul 2016 to 4 Jul 2016
Porto Palace Conference Centre & Hotel
Thessaloniki, GR

Join this Action

If you would like to join COST Action MP1402, please send an email to the HERALD Chair.

Further details on joining COST actions can be found on our How to Join page.

Working Groups

To elucidate ALD mechanisms through metrology, especially in situ measurements, and through modeling of growth chemistry.

To synthesise new chemical precursors and use them in thin film deposition experiments to find viable ALD processes for materials where no process exists at present.

To achieve control of interfaces through ALD, understanding nucleation, depositing onto 2D materials and developing new approaches to selective-area ALD.

To develop and integrate ALD processes for oxides, sulfides and nitrides for applications in transparent electronics, memristors, light emitting devices and nanosensors, in collaboration with industry.

To develop processes for the molecular layer deposition (MLD) of hybrid organic/inorganic films, along with optimization of material properties.