Collaborations are facilitated by HERALD funding for laboratory visits.

Displaying 21 Collaborations
ALD and characterisation of High-k dielectrics on GaSb

Antimonide based compound semiconductors present particularly suitable properties for future energy efficient CMOS technologies. These semiconductors have a small and direct energy bandgap and more importantly they present high carrier mobility for both electrons and holes which could lead to...Read more

ALD with organic substrates

Organic and polymeric materials are frequently used as substrates for atomic layer deposition or molecular layer deposition. In many cases such processes proceed in a desired way and the substrate experiences a thin film coating. However, often the organic or polymeric substrate is chemically...Read more

ALD/MLD of luminescent inorganic-organic hybrid thin films

Atomic-layer-deposition (ALD) in combination with molecular-layer-deposition (MLD), is a highly promising technique to produce inorganic-organic hybrid thin films with precisely controlled thickness over a multitude of different surface structures.[1] The advantage of these hybrid layers is the...Read more

Atomic layer deposition and 3D nanoscale substrates – nanowires, nanotubes and nanopores

The conformal growth of Atomic Layer Deposition (ALD) processes enables functional films on sophisticated 3D substrates like nanowires, nanotubes and nanoporous materials. The coating of such nanoscale structures is an emerging technology for the development of novel materials, devices and...Read more

Characterization of Hybrid Materials

ALD enables to fabricate hybrid materials in two ways. On the one hand, the hybrid films can be grown bottom-up by including organic molecules into the processing scheme and in this way incorporating an organic fraction into the final film. On the other hand, polymeric substrates can be top-down...Read more

Conformality analysis of ALD thin films

High conformality is among the main benefits of ALD thin films compared to those made by other deposition methods. So far, there has not been standard means available for analysing thin film conformality. The purpose of this collaboration is to compare different ways of conformality analysis,...Read more

Deposition of ZnO-based TCO by Spatial Atomic Layer Deposition

Zinc oxide (ZnO) based TCOs are a very good candidate to replace ITO in photovoltaics since ZnO is an abundant, low cost material being able to provide a high transparency and conductivity. The collaboration between Device Materials Group - University of Cambridge, United Kingdom and the...Read more

Effect of the atomic layer deposition process on the crystallization properties of alumina

Atomic layer depositions (ALD) of Al2O3 from TMA and H2O, or O3 are well-established and widely studied processes that have been also thoughtfully theoretically simulated and serve as prototype examples for the definition of the atomic layer deposition itself. ALD gives amorphous Al2O3 thin...Read more

Guanidinate based precursors for group 13 nitride ALD

In this collaboration we aim to explore guanidinate precursors [(Me2N)C(NiPr)2]xM(NMe2)3-x, where M = Al, Ga or In for low temperature CVD and ALD of group 13 nitrides (AlN, GaN, InN and their alloys). Precursors will be synthesized by the Barrylab at Carleton University, Ottawa, Canada and...Read more

III-Nitride Ordered Nanostructures via Template-assisted Atomic Layer Deposition

In this COST collaboration, Bilkent-UNAM ALD groups led by Dr. Necmi Biyikli and Dr. Ali Kemal Okyay team-up with two external research groups: Dr. Ibrahim Yilmaz from Turgut Ozal University, Electrical & Electronics Engineering, who is an MC member of HERALD as well, and Dr. Fatih...Read more

In-situ ALD of 2D materials: theory and experiment

2D materials are of high interest for the scientific community from fundamental and applied science perspectives.

New synthetic route are desired. ALD is able to grow controlled numbers of layers.

The elucidation of the mechanisms of ALD layer growth in 2D materials will be the...Read more

Investigation of protective oxide coatings for micromirror applications

In this collaboration we develop by low temperature ALD thin films and multistacks of oxides for micromirror applications. The thickness are especially designed for optimizing the performance in defined spectral ranges. The structural, optical and mechanical properties are evaluated. Integration...Read more

Mechanical properties, composition and structure of HfO2/Al2O3 nanolaminates

The collaboration between Aalto University, Finland, and CNR-MDM-IMM, Italy, was dedicated to growth and characterization of low temperature (175°C) ALD HfO2/Al2O3 nanolaminates. The characterization involved: X-ray reflectivity (XRR), X-ray diffraction (XRD), atomic force microscopy (AFM), and...Read more

Precursor design for boron-carbides

Boron-carbide thin films from CVD using organo-boron precursors are intensively investigated in the Pedersen group. The gas phase chemistry plays a crucial role for film deposition in CVD and a better understanding of the CVD chemistry of the organo-boron molecules can aid in the design of an...Read more

Short term mission: Lithium ion intercalation into titanium dioxide

Dependence of electrochemical behaviour of anatase on film thickness was investigated during collaboration between Institute of Electrical Engineering SAS and CoCooN Ugent, as a short term mission by master`s student from IEE.

Anatase intercalates readily forming a rich lithium phase and...Read more

Short term scientific mission : In-situ characterization of the calcination of an alucone film

In-situ characterization of the calcination process of alucone films to obtain a porous alumina layers was investigated during a collaboration between CoCoon (Ghent University) and  CINaM (Aix-Marseille Université-CNRS).

The alucone films were grown by Molecular Layer Deposition (MLD) on...Read more

Short Term Scientific Mission: Atomic Layer Deposition of Copper films using novel Copper (I) precursors

The low resistivity of copper metal has made it the candidate of choice for interconnecting microelectronics devices using electrically conducting thin films. Copper films for microelectronics are typically formed by electrodepositing copper on a Cu seed layer which is deposited using a vapor...Read more

Short Term Scientific Mission: Exploration of Molybdenum oxide deposition by using novel Mo precursor

The collaboration between Laboratory of Inorganic Chemistry – University of Helsinki, Finland, and CNR-MDM-IMM, Italy, had the aim to develop  a novel ALD recipe for thin film MoO3 deposition by using a novel molybdenum b-diketonate type precursor.

The growth of Molybdenum oxide by...Read more

Short Time Scientific Mission: Investigation of the effect of capacitively coupled plasma modes on the PEALD films

Plasma-enhanced atomic layer deposition, providing advantages and freedom in material properties and processing conditions compared to the conventional thermal ALD, can sometimes be hampered by the discrepancies in the film growth and complicated control of the resulting film properties. To...Read more

Understanding formation of thin-film cathode material: Evolution of Mn oxidation state and coordination upon gas-solid reactions for LixMn2O4

Lithium manganese oxide spinel (LixMn2O4) is an important cathode material for lithium-ion batteries (LIBs). It is a low-cost and low-toxicity material as compared to the dominating cathode material LiCoO2. For solid-state LIBs, where the battery stack...Read more

Virtual Project on the History of ALD

A worldwide voluntary effort called “Virtual Project on the History of ALD” (VPHA), open for everyone with an ALD background to participate, was launched in summer 2013 to explore how the ALD concept was developed; which were the first ALD experiments; when, where, why and by whom they were made...Read more