HfO2

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Collaboration

The collaboration between Aalto University, Finland, and CNR-MDM-IMM, Italy, was dedicated to growth and characterization of low temperature (175°C) ALD HfO2/Al2O3 nanolaminates. The characterization involved: X-ray reflectivity (XRR), X-ray diffraction (XRD), atomic force microscopy (AFM), and...Read more

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