In collaboration with COST action HERALD, Eindhoven University will host the 2nd Area Selective Deposition workshop (ASD 2017), which will be held on April 20-21, 2017. The aim of this workshop is to bring together leading scientists and engineers from both academia and industry, to discuss the fundamentals of area selective deposition, as well as its applications.
Similar to last year’s successful workshop at IMEC, ASD 2017 will consist of one day of presentations and discussions. This scientific program will take place on April 21 in the city center of Eindhoven (90 minutes from Amsterdam), and will be preceded by a welcome reception at Eindhoven University on April 20. We are pleased to confirm the following invited speakers: Stacey Bent (Stanford University), John Abelson (University of Illinois at Urbana-Champaign), Rong Chen (Huazhong University), and Younghee Lee (University of Colorado at Boulder).
In addition to several invited presentations, this year’s program will include a few contributed presentations to feature recent developments in the field. The topics for these presentations will be selected based on abstracts received. Furthermore, there will be a poster session covering work related to nucleation, selective deposition, and nanopatterning. The abstract deadline is February 21. Note that this deadline is relatively tight.
The workshop is free, but registration for the scientific program and the welcome reception is mandatory. The registration deadline is April 12. Please see www.nanomanufacturing.nl/ASD2017 for more information about abstract submission and registration.
The ASD Program Committee is looking forward to your attendance.
Scott Clendenning (Intel Corporation), Annelies Delabie (IMEC), Dennis Hausmann (LAM Research), Rami Hourani (Intel Corporation), Gregory Parsons (North Carolina State University), and Adrie Mackus (Eindhoven University of Technology)