Publications

The following publications were co-authored by at least two Action participants from two different countries participating in HERALD, where HERALD networking added value.

Displaying 10 publications

10.1002/admi.201700237

Reversible and Irreversible Reactions of Trimethylaluminum with Common Organic Functional Groups as a Model for Molecular Layer Deposition and Vapor Phase Infiltration
Fan Yang, Jens Brede, Hayrensa Ablat, Mikel Abadia, Lianbing Zhang, Celia Rogero, Simon D. Elliott, Mato Knez
Adv. Mater. Interfaces
2017
1700237

10.1021/acsami.6b12267

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Tahsin Faraz, Maarten van Drunen, Harm Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis Hausmann, Jon Henri, Erwin Kessels
ACS Applied Materials & Interfaces
2017
9
2
1858
1869

10.1116/1.4971389

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
Journal of Vacuum Science and Technology A
2017
35
10801

10.1016/j.apsusc.2016.01.216

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications
Maria Berdova, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila
Applied Surface Science
2016
368
470
476

10.1116/1.4961113

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition
Maria Berdova, Xuwen Liu, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Marco Fanciulli, Sami Franssila
Journal of Vacuum Science & Technology A
2016
34
5
51510

10.1039/c5dt00922g

Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copper
Dey, G; Wrench, JS; Hagen, DJ; Keeney, L; Elliott, SD
Dalton Transactions
2015
44
12
10188
10199

10.1039/c5ta00111k

Antimony sulfide as a light absorber in highly ordered, coaxial nanocylindrical arrays: preparation and integration into a photovoltaic device
Yanlin Wu, Loïc Assaud, Carola Kryschi, Boris Capon, Christophe Detavernier, Lionel Santinacci and Julien Bachmann
J. Mater. Chem. A
2015
3
5971
5981

10.1021/acsami.5b06833

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
Harm C. M. Knoops, Eline M. J. Braeken, Koen de Peuter, Stephen E. Potts, Suvi Haukka, Viljami Pore, and Wilhelmus M. M. Kessels
ACS Appl. Mater. Interfaces
2015
7
35
19857
19862

10.1039/C5TC02293B

Gas phase chemical vapor deposition chemistry of triethylboron probed by boron–carbon thin film deposition and quantum chemical calculations
Imam, Mewlude; Gaul, Konstantin; Stegmüller, Andreas; Höglund, Carina; Jensen, Jens; Hultman, Lars; Birch, Jens; Tonner, Ralf; Pedersen, Henrik
Journal of Materials Chemistry C
2015
3
41
10898
10906

10.1116/1.4964890

Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors
E. Filatova, D. Hausmann and S. D. Elliott
J. Vac. Sci. Techn. A
2017
35
1