WG1 - Mechanism, metrology and modelling

Description and purpose: 

To elucidate ALD mechanisms through metrology, especially in situ measurements, and through modeling of growth chemistry.

Joint publications:

10.1021/acsami.5b06833

10.1039/C5TC02293B

10.1116/1.4964890

10.1039/c5dt00922g

Workshops for this WG:

Simulation of chemistry-driven growth phenomena for metastable materials

Workshop on ALD FUNdamentals and reaction mechanisms

Synchrotron Radiation to study Atomic Layer Deposition