HERALD promotes European research activity in Atomic Layer Deposition (ALD)

HERALD (COST action MP1402) aims to structure and integrate European research activity in atomic layer deposition (ALD), bringing together existing groups, promoting young scientists and reaching out to industry and the public.  ALD is a unique technique for growing ultra-thin films that is enabling new developments in high-tech manufacturing sectors such as electronics, energy and coatings. With interest growing worldwide, the time is right to coordinate European activity in this field.  HERALD supports collaboration through lab visits, workshops and training schools.

News

HERALD network news

Important announcements about the HERALD network

1. Conference funding for Inclusiveness Targetted Countries (ITC)

The EU has granted extra budget to COST and this is being passed on to running...Read more

Special journal issue on ALD

Coatings logo

You are invited to submit original research or review articles on topics related to ALD to a special issue of the open-access journal "Coatings". The closing date for submission is...Read more

Next Event

Training school (deadline for registration 28 Sep 2017)
6 Nov 2017 to 8 Nov 2017
Survontie 9 C, Jyväskylä, FI

Join this Action

If you would like to join COST Action MP1402, please send an email to the HERALD Chair.

Further details on joining COST actions can be found on our How to Join page.

Working Groups

To elucidate ALD mechanisms through metrology, especially in situ measurements, and through modeling of growth chemistry.

Joint publications:

10.1021/acsami.5b06833

10.1039/C5TC02293B

10.1116/1.4964890

10.1039/c5dt00922g

Workshops for this WG:...

To synthesise new chemical precursors and use them in thin film deposition experiments to find viable ALD processes for materials where no process exists at present.

Joint publications:

10.1116/1.4961113...

To achieve control of interfaces through ALD, understanding nucleation, depositing onto 2D materials and developing new approaches to selective-area ALD.

Joint publications:

10.1021/acsami.5b06833

10.1116/1.4961113

Workshops for this WG:...

To develop and integrate ALD processes for oxides, sulfides and nitrides for applications in transparent electronics, memristors, light emitting devices and nanosensors, in collaboration with industry.

Joint Publications:

10.1016/j.apsusc.2016.01.216...

To develop processes for the molecular layer deposition (MLD) of hybrid organic/inorganic films, along with optimization of material properties.

Workshops for this WG:

WORKSHOP ON HYBRID MATERIALS BY ALD/MLD...