March 2018

Training School on the Chemistry of ALD

HERALD COST action (MP1402: Hooking together European research in Atomic Layer Deposition) and MASSENA doctoral program (Materials for Sensing and Energy harvesting) co-organize a Training School entitled “Chemistry of Atomic Layer Deposition” (https://www.list.lu/en/event/belux3/ ) the 19 and 20 march in Luxembourg.

 

Experts from ALD-complementary fields animate a two days’ interactive training school about aspects associated with the chemistry behind the ALD process.

The following aspects will be addressed:

1-ALD opportunities and challenges by Dr. Elisabeth Blanquet, Univ. Grenoble Alps, Research Director, SIMAP, France

2- Precursor design and its impact on the ALD chemistry and kinetics  by Dr. Jean-Marc Girard, CTO and Head of R&D at Air Liquide Advanced Materials, France

3- Modelling aspects and tools by Dr. Alain Estève, Research Director, Head of NEO group “Nano-Engineering and integration of metal-Oxide-based nanostructures and their interfaces” LAAS-CNRS, France

4- In situ investigation of the ALD process by Dr. Martin...

Symposium focused on ALD at the EMRS Fall Meeting 2018

 

SYMPOSIUM N: New ALD appraoches towards functional materials and devices

17th-19th September 2018

Deadline for abstract submission: Monday 21st May

ALD is a chemical deposition technique traditionally used in the field of microelectronics and large area displays. In recent years ALD has seen a huge evolution in terms of the materials that can be deposited, the reactors and the applications. This symposium aims at highlighting recent developments in the field of ALD of functional materials and devices and to present the ALD community to the broader materials science community.

Scope:

ALD is a Chemical Vapour Deposition technique that is surface-limited and self-terminating. As a result, film thickness can be controlled very precisely to the nanometer, high aspect ratio features can be coated with a unique level of conformality, and, film homogeneity is unrivalled. ALD, with its unique characteristics, was developed in the 1970s to meet demands in...