May 2018

2018 Millennium Technology Prize for Tuomo Suntola

Congratulations to Dr Tuomo Suntola who was awarded the €1m Millennium Technology Prize yesterday for the invention of ALD. Full details are in the announcement from Technology Academy Finland along with a video. A wonderful day for the nominators from the ALD community.

Here is a message from Dr Suntola: ”In the long run, I like to share the honor of the Millennium prize with all my colleagues having worked with me for the technology, the companies hosting and financing the development, and the co-operating universities and funding organizations supported the work. I like to thank all parties for the confidence and patience in getting through times when the goal looked distant. Finally, my special thanks go to the thousands of scientists and engineers who, finally, have made the technology a global success and an important part of our everyday life.”...

Call for STSMs now open

The final grant period of HERALD has now commenced and will end in early December.  We are now accepting funding applications for laboratory visits (STSMs) to take place before the end of October 2018.  The instructions for applying are on the HERALD website.

Some other reminders:

  • Please remember that you must acknowledge HERALD in any papers, talks or posters that have benefitted from HERALD activity (workshops, training or STSMs).
  • If you have a publication that is co-authored by at least two HERALD participants from two different countries, where HERALD networking added value, please input it into the website via 'Create Content'-'Publication' - you just need the DOI.  This is an important measure of the success of our network.
  • The HERALD Summit will take place on 25-28 September in Braga, Portugal.  The call for abstracts and registrations will open later this month.  Some travel bursaries will be available. 
  • ...

Graphene Study 2018: Opportunity for COST researchers to receive a student grant

From the COST Office:

We would like to inform you that the summer edition of the Graphene study 2018, (the Graphene Flagship school for early career researchers and students) will focus on 2D materials for environment and energy applications. The study will be held from 1st - 6th July 2018 in Hindås, Sweden.

COST is collaborating with the Graphene Flagship, and will therefore actively participate at this event. In this context, the Graphene Flagship has the courtesy to entitle the students from our COST Actions to apply for a student grant, to defray the cost of attendance.

Lecturers will delve into deeper aspects of how things work, exploring experimenters' techniques in studying energy and environmental applications for graphene, mainly filtration and energy storage technologies. Leading academic and industry experts from around the world, including Rohit Karnik from the Massachusetts Institute of Technology, Aleksandra Radenovic from the École Polytechnique Fédérale de Lausanne and David A. Pacheco...

Last opportunity to submit: deadline moved to 28th May, Symposium focused on ALD at the EMRS Fall Meeting 2018

SYMPOSIUM N: New ALD appraoches towards functional materials and devices

 

Deadline for abstract submission: Monday 28th May

Over 50 abstracts already submitted. Don't miss it! 

Poster Prize sponsored by Advanced Materials Interfaces. 

17th-20th September 2018

https://www.european-mrs.com/new-atomic-layer-deposition-approaches-towa...

ALD is a chemical deposition technique traditionally used in the field of microelectronics and large area displays. In recent years ALD has seen a huge evolution in terms of the materials that can be deposited, the reactors and the applications. This symposium aims at highlighting recent developments in the field of ALD of functional materials and devices and to present the ALD community to the broader materials science community.

Scope:

ALD is a Chemical Vapour Deposition technique that is surface-limited and self-terminating. As a result, film thickness can be controlled very precisely to the nanometer, high aspect ratio features can be coated with a unique level of conformality, and, film...