The 16th International Conference on Atomic Layer Deposition (ALD 2016) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. This year, the ALD conference will incorporate the Atomic Layer Etching 2016 Workshop, so that delegates at the two events can interact freely.
The conference will take place on 24-27 July 2016 at the Convention Centre Dublin, Ireland. As in past conferences, the meeting will be preceded by one day of tutorials. An industry trade show will be held in conjunction with the conference, to act as common ground for academia and industry to meet and discuss the future applications of ALD. Extra opportunities for collaboration will be provided through sessions devoted to the HERALD working groups, overall HERALD strategy, a poster session and panel discussion. The conference will be preceded by the 3rd meeting of the HERALD Management Committee.
Early-bird registration rates are available until 31 March 2016. A limited number of HERALD travel bursaries for the conference are available through a collaboration competition. Please register for the HERALD sessions here by 13th July (password HERALD).