Area Selective Deposition Workshop - ASD 2016



15 Apr 2016


Remisebosweg 1, 3001 Leuven




Leuven, BE

Imec and the COST action HERALD will host a workshop dedicated to Area Selective Deposition “ASD 2016”, at imec in Leuven, Belgium on April 15th, 2016. This ASD workshop will provide an excellent opportunity to learn about Area Selective Deposition and it will offer a forum for open discussions between researchers from academia and industry. We look forward to your participation.

Area Selective Deposition (ASD) has been proposed as a promising “bottom up” strategy for patterning in semiconductor device manufacturing. Alignment by conventional lithography techniques is becoming increasingly challenging as device dimensions are further decreasing. In ASD, differences in surface reactivity are exploited to deposit the material only where needed on a pre-patterned structure. As a result, the created patterns are self-aligned to the underlying pattern.
The workshop will focus on the fundamental mechanisms of ASD processes and nucleation, as well as on the challenges related to the characterization of selectivity.  Potential applications of selective deposition will be discussed.
The 1 day program will consist of:

  • Presentations by invited speakers on the fundamentals and characterization of selectivity
  • A panel discussion about potential applications of selective deposition
  • A poster session covering selective deposition as well as nucleation. Poster contributions are welcome by abstract submission
  • Coffee breaks, lunch and dinner

More information is available at


Organising Members: