Belux 3: Chemistry of Atomic Layer Deposition

Training School


19 Mar 2018 to 20 Mar 2018



Chemistry of Atomic Layer Deposition

Belux 3 Training School

HERALD COST action (MP1401: Hooking together European research in Atomic Layer Deposition) and MASSENA doctoral program (Materials for Sensing and Energy harvesting) co-organize a Training School entitled “Chemistry of Atomic Layer Deposition”.

Experts from ALD-complementary fields animate a two days’ interactive training school about aspects associated with the chemistry behind the ALD process.

The following aspects will be addressed:

1-      ALD opportunities and challenges
Dr. Elisabeth Blanquet, Univ. Grenoble Alps, Research Director, SIMAP, France
ResearchGate, Linkedin

2-      Precursor design and its impact on the ALD chemistry and kinetics
Dr. Jean-Marc Girard
, CTO and Head of R&D at Air Liquide Advanced Materials, France

3-      Modelling aspects and tools
Dr. Alain Estève
, Research Director, Head of NEO group “Nano-Engineering and integration of metal-Oxide-based nanostructures and their interfaces” LAAS-CNRS, France

4-      In situ investigation of the ALD process
Dr. Martin Knaut
, Institute of Semiconductors and Microsystems, Dresden, Germany
ResearchGate, Linkedin

5-      Approaches for area-selective ALD
Dr. Christophe Vallée
, CEA – LETI - MINATEC, Grenoble, France. Head of the material department of Polytech Grenoble, Professor at Grenoble Alpes University and at Tsukuba University (Japan).
ResearchGate, Linkedin

Poster presentation

To enhance the interaction with the trainers, participants active in the field of ALD, or in activities in which ALD might play a role, are encouraged to prepare an A0 poster support.


Limited number of travel grants (650 €/participant) will be given upon evaluation of applications. Participation from ITC countries is strongly encouraged. Thank you to inform us of your application in the registration form.

Organising Members: