Workshop on Fundamentals of Atomic Layer Deposition: Modelling and Validation



3 Jul 2019


TU Delft

We are excited to announce a one day workshop at TU Delft on modeling and experimental analysis of ALD processes. We are hosting an international group of invited speakers who will present simulation and experimental work on fundamentals and applications of ALD. 

The workshop includes five invited sessions, one lecture on simulating ALD, lunch and a poster session. Students are encouraged to bring posters to present their research to the community.

Date: July 3rd, 2019

Place: TU Delft/ Department of Chemical Engineering, building 58, room B1.100, Van der Maasweg 9, 2629 HZ, Delft

Registration is free but required.

Organizers: Fatemeh Hashemi, Ruud van Ommen

For questions regarding the workshop please contact: Fatemeh Hashemi (



9:30-9:45  Opening and welcome

    Fatemeh Hashemi (TU Delft)

9:45-10:25    Session 1: Surface coverage in ALD

    Riikka Puurunen (Aalto Universty, Finland)

10:25-11:05    Session 2:  Area selective ALD

    Simulation: Esteban Marques (IMEC, Belgium)

    Experiment: Job Soethoudt (IMEC, Belgium)

11:05-11:45   Session 3: Cluster size in noble metal

    Simulation: Fabio Grillo (ETH, Switzerland)

    Experiment: Damiano La Zara (TU Delft, The Netherlands)

11:45-1:15   Lunch + Poster Session

1:15-2:30    Mini Lecture on “Simulating ALD ”

    Angel Yanguas-Gil (Argonne National Lab., USA)

2:30- 3:10   Session 4: ALD of 2D materials

    Simulation: Mahdi Shirazi (TU Eindhoven, The Netherlands)

    Experiment: Shashank Balasubramanyam (TU Eindhoven, The Netherlands)

3:10-3:50    Session 5: ALD for photocatalysis reactions

    Simulation: Stephen Rhatigan (Tyndall, Ireland)

    Experiment: Hamid Zafarani (TU Delft, The Netherlands)

3:50-4:30   Closing


Organising Members: 

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