Elena Cianci

Action Member

COST Country: 

  • Italy

Primary Working Group: 

Affiliations: 

Keywords: 

Personal or laboratory research profile: 

Researcher at Institute for Microelectronics and Microsystems IMM-CNR Italy since2009 with experience in ALD related topics, in thin film process and characterization, and silicon-based microfabrication.

Current working fields: ALD of high k dielectrics for advanced logic and memory devices, ALD of oxides for MEMS, 2D materials

Publications

10.1016/j.apsusc.2016.01.216

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications
Maria Berdova, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila
Applied Surface Science
2016
368
470
476

10.1116/1.4961113

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition
Maria Berdova, Xuwen Liu, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Marco Fanciulli, Sami Franssila
Journal of Vacuum Science & Technology A
2016
34
5
51510