Erwin Kessels

Action Member

COST Country: 

  • Netherlands

Primary Working Group: 

Affiliations: 

Personal or laboratory research profile: 

Erwin Kessels is a full professor at the Department of Applied Physics of the Eindhoven University of Technology TU/e (The Netherlands). He is also the scientific director of the NanoLab@TU/e facilities which provides full-service and open-access clean room infrastructure for R&D in nanotechnology. Erwin received his M.Sc. and Ph.D. degree (with highest honors) in Applied Physics from the TU/e in 1996 and 2000, respectively. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award for "pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth". In recognition of his research, he received a NWO Vici grant in 2010 to set up a large research program on “nanomanufacturing” in order to bridge the gap between nanoscience/nanotechnology and industrial application. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within nanoelectronics and photovoltaics. Within the field of ALD, he has contributed to the field most prominently by his work on plasma-assisted ALD and his research related to ALD for photovoltaics. Erwin has been serving on many conference committees in the field of ALD and he chaired the International Conference on Atomic Layer Deposition in 2008. Erwin has published over 200 papers with over 100 papers in the field of ALD.

Publications

10.1021/acsami.8b00183

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
T. Faraz, H.C.M. Knoops, C.A.A. van Helvoirt, M.A. Verheijen, S. Karwal, A. Sharma, V. Beladiya, A. Szeghalmi, D.M. Hausmann, J. Henri, M. Creatore and W.M.M. (Erwin) Kessels
ACS Applied Materials & Interfaces
2018
10
13158
13180

10.1021/acsami.6b12267

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Tahsin Faraz, Maarten van Drunen, Harm Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis Hausmann, Jon Henri, Erwin Kessels
ACS Applied Materials & Interfaces
2017
9
2
1858
1869

10.1021/acsami.5b06833

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
Harm C. M. Knoops, Eline M. J. Braeken, Koen de Peuter, Stephen E. Potts, Suvi Haukka, Viljami Pore, and Wilhelmus M. M. Kessels
ACS Appl. Mater. Interfaces
2015
7
35
19857
19862