Henrik Pedersen

Action Member

COST Country: 

  • Sweden

Primary Working Group: 

Affiliations: 

Keywords: 

Personal or laboratory research profile: 

My research is focused on understanding and developing chemical vapor deposition (CVD) for electronic materials. By a better understanding of the chemistry – both surface chemistry and gas phase chemistry – better CVD routes for better electronic materials can be found which will allow fabrication of better electronic devices. The research approach is to combine film deposition experiments using different precursor molecules with multi scale simulations of the chemistry to form chemical mechanisms of the film deposition in CVD. In addition to this I also develop new CVD routes by exploring new CVD hardware and by introducing time as a variable in film deposition by CVD - e.g. by doing ALD

Publications

10.1116/1.5002634

Thermal study of an indium trisguanidinate as a possible indium nitride precursor
Sydney C Buttera, Karl Rönnby, Henrik Pedersen, Lars Ojamäe, Sean T Barry
Journal of Vacuum Science and Technology A
2018
36
1

10.1021/acs.jpcc.7b09538

Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition
Mewlude Imam, Laurent Souqui, Jan Herritsch, Andreas Stegmüller, Carina Höglund, Susann Schmidt, Richard Hall-Wilton, Hans Högberg, Jens Birch, Ralf Tonner, and Henrik Pedersen
Journal of Physical Chemistry C
2017

10.1039/C5TC02293B

Gas phase chemical vapor deposition chemistry of triethylboron probed by boron–carbon thin film deposition and quantum chemical calculations
Imam, Mewlude; Gaul, Konstantin; Stegmüller, Andreas; Höglund, Carina; Jensen, Jens; Hultman, Lars; Birch, Jens; Tonner, Ralf; Pedersen, Henrik
Journal of Materials Chemistry C
2015
3
41
10898
10906

http://dx.doi.org/10.1039/c5tc02293b

Gas Phase Chemical Vapor Deposition Chemistry of Triethylboron Probed by Boron-Carbon Thin Film Deposition and Quantum Chemical Calculations
Mewlude Imam, Konstantin Gaul, Andreas Stegmüller, Carina Höglund, Jens Jensen, Lars Hultman, Jens Birch, Ralf Tonner, Henrik Pedersen
J. Mat. Chem. C
2015
3
10898