Simon Elliott

Action Member

COST Country: 

  • Ireland

Primary Working Group: 

Affiliations: 

Keywords: 

Personal or laboratory research profile: 

Progressing the field of simulation of atomic level processing of thin films for high-tech devices, including research into:

  • atomic layer deposition (ALD)
  • atomic layer etch (ALE)
  • chemical vapour deposition (CVD)
  • plasma-surface interaction
  • design of precursor chemicals
  • nucleation onto substrates
  • new simulation approaches.

Schrödinger welcomes collaborations and other business opportunities with academic and commercial R&D groups in these fields.

Publications

10.1021/acs.chemmater.7b03747

Suppressing the Thermal and Ultraviolet Sensitivity of Kevlar by Infiltration and Hybridization with ZnO
Itxasne Azpitarte, Ana Zuzuarregui, Hayrensa Ablat, Leire Ruiz-Rubio, Alberto López-Ortega, Simon D. Elliott, and Mato Knez
Chem. Mater.
2017
29
23
10068
10074

10.1002/admi.201700237

Reversible and Irreversible Reactions of Trimethylaluminum with Common Organic Functional Groups as a Model for Molecular Layer Deposition and Vapor Phase Infiltration
Fan Yang, Jens Brede, Hayrensa Ablat, Mikel Abadia, Lianbing Zhang, Celia Rogero, Simon D. Elliott, Mato Knez
Adv. Mater. Interfaces
2017
1700237

Address: 

Schrödinger
Midleton
Co Cork
Ireland