Primary Working Group:
Personal or laboratory research profile:
Progressing the field of simulation of atomic level processing of thin films for high-tech devices, including research into:
- atomic layer deposition (ALD)
- atomic layer etch (ALE)
- chemical vapour deposition (CVD)
- plasma-surface interaction
- design of precursor chemicals
- nucleation onto substrates
- new simulation approaches.
Schrödinger welcomes collaborations and other business opportunities with academic and commercial R&D groups in these fields.