Tahsin Faraz

Action Member

COST Country: 

  • Netherlands

Primary Working Group: 

Affiliations: 

Keywords: 

Publications

10.1021/acsami.8b00183

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
T. Faraz, H.C.M. Knoops, C.A.A. van Helvoirt, M.A. Verheijen, S. Karwal, A. Sharma, V. Beladiya, A. Szeghalmi, D.M. Hausmann, J. Henri, M. Creatore and W.M.M. (Erwin) Kessels
ACS Applied Materials & Interfaces
2018
10
13158
13180

10.1021/acsami.6b12267

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Tahsin Faraz, Maarten van Drunen, Harm Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis Hausmann, Jon Henri, Erwin Kessels
ACS Applied Materials & Interfaces
2017
9
2
1858
1869