Tahsin Faraz

Action Member

COST Country: 

  • Netherlands

Primary Working Group: 

Affiliations: 

Keywords: 

Publications

10.1021/acsami.6b12267

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Tahsin Faraz, Maarten van Drunen, Harm Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis Hausmann, Jon Henri, Erwin Kessels
ACS Applied Materials & Interfaces
2017
9
2
1858
1869