Timo Weckman

Action Member

COST Country: 

  • Finland

Primary Working Group: 



Personal or laboratory research profile: 

I am a doctoral candidate working with professor Kari Laasonen. I use quantum chemistry methods to study the surface reactions of various ALD processes and to link my findings to macroscopic phenomena. Currently we have published computational studies on the growth of alumina and zinc oxide ALD thin films.


Atomic Layer Deposition of Zinc Oxide: Diethyl Zinc Reactions and Surface Saturation from First-Principles

Timo Weckman, Kari Laasonen

Journal of Physical Chemistry C, 2016, 120(38)21460-21471

First principles study of the atomic layer deposition of alumina by TMA-H2O-process

Timo Weckman, Kari Laasonen

Physical Chemistry Chemical Physics, 2015, 17(26)17322-17334