Primary Working Group:
Personal or laboratory research profile:
I operate an ALD instrument from SENTECH Instruments since 2013. We have got the following options: Thermal ALD, Plasma Enhanced Deposition (remote), In-Situ Ellipsometry (SE), Ellipsometry Mapping, Process Gases "O3, O2, NH3, H2, N2 and Ar".
I am also a user of a Dual Beam System from FEI.