LAST CHANCE to submit an abstract for Advances in Atomic Layer Deposition Technologies symposium-MSE 2018

MSE Abstract submission due Feb 28th


P05: Advances in Atomic Layer Deposition Technologies: Conformal Thin Films and Hybrid Materials for Energy, Electronics and Health       



Symposium topics

  • Precursor chemistries for complex material compositions by ALD
  • Reactions mechanisms, simulations and in-situ monitoring of ALD thin-film growth 
  • Patterning and atomic layer etching 
  • New concepts: Hybrid materials, biomaterials, laminates and composites 
  • Advances in deposition technologies: Thermal, plasma and alternative methods including high volume manufacturing 
  • Nanocoatings for microelectronics, energy conversion and storage

Confirmed Invited Speakers

  • Ola Nilsen, University of Oslo, Norway
  • Suresh Kondati Natarajan, Tyndall Nat. Institute, Ireland
  • A.J.M. Mackus, Technische Universiteit Eindhoven, The Netherlands
  • Fieke van den Bruele, TNO, The Hague, The Netherlands
  • Julien Bachmann, Friedrich Alexander University Erlangen-Nürnberg, Germany
  • Marceline Bovalot, CEA LETI, Grenoble, France
  • Benjamin Groven IMEC, Belgium
  • Mato Knez, CIC NanoGUNE, San Sebastian, Spain



Symposium Organizers

Mariona Coll - Institut de Ciència de Materials de Barcelona, Spain
Thomas Fischer - University of Cologne, Department für Chemistry, Germany
Mercedes Vila - CTECHnano, Spain
Changdeuck Bae - Sungkyunkwan University, Energy Materials Laboratory, Korea 
Yakup Gönüllü - Schott AG, Mainz, Germany
Susanne Hoffmann-Eifert - Forschungszentrum Jülich, Peter Grünberg Institute Electronic Materials, Germany