Materials Science Engineering MSE 2018

P05: Advances in Atomic Layer Deposition Technologies: Conformal Thin Films and Hybrid Materials for Energy, Electronics and Health       

Precise control of materials interface and surface is a key enabling technology for enhanced performance in microelectronics, optics, photovoltaics, biomedical implants, etc. Especially moving from 2D to 3D surfaces with a well-defined and engineered thin-film composition, homogeneity, conformality as well as ease of fabrication is a paradigm shift in materials integration. Atomic Layer Deposition (ALD), Atomic Layer Etching (ALEt) and related technologies enable a precise thin-film control for a steadily increasing demand of materials and materials combinations. Fundamental studies are needed to provide the necessary understanding for advancing in this growing field and be able to fully implement it in current and future applications. Precursor chemistry, deposition speed and cost remain the target of most research and development efforts. This symposium will target current trends and advances in Atomic Layer Deposition and related technologies with special emphasis on their application in microelectronics, optics, biomaterials and energy generation and storage. 

  • Precursor chemistries for complex material compositions 
  • Reactions mechanisms, simulations and in-situ monitoring of thin-film growth 
  • Patterning and atomic layer etching 
  • New concepts: Hybrid materials, biomaterials, laminates and composites 
  • Advances in deposition technologies: Thermal, plasma and alternative methods including high volume manufacturing 
  • Nanocoatings for microelectronics, energy conversion and storage

ABSTRACT SUBMISSION DEADLINE: 28th February 2018

 

Symposium Organizers

Mariona Coll - Institut de Ciència de Materials de Barcelona, Spain
Thomas Fischer - University of Cologne, Department für Chemistry, Germany
Mercedes Vila - CTECHnano, Spain
Changdeuck Bae - Sungkyunkwan University, Energy Materials Laboratory, Korea 
Yakup Gönüllü - Schott AG, Mainz, Germany
Susanne Hoffmann-Eifert - Forschungszentrum Jülich, Peter Grünberg Institute Electronic Materials, Germany

 

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