Publications

The following publications were co-authored by at least two Action participants from two different countries participating in HERALD, where HERALD networking added value.

Displaying 14 publications

10.1039/c8nr06468g

Multi-functional MnO2 nanomaterials for photoactivated applications by a plasma-assisted fabrication route
D. Barreca, F. Gri, A. Gasparotto, G. Carraro, L. Bigiani, T. Altantzis, B. Žener, U. Lavrenčič Štangar, B. Alessi, D. Babu Padmanaban, D. Mariotti, C. Maccato
Nanoscale
2018

https://doi.org/10.3390/nano7070193

Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
Aleksandra Radtke, Tomasz Jędrzejewski, Wiesław Kozak, Beata Sadowska, Marzena Więckowska-Szakiel, Ewa Talik, Maarit Mäkelä, Markku Leskelä and Piotr Piszczek
Nanomaterials
2017
7
7
193

10.1021/acsami.8b00183

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
T. Faraz, H.C.M. Knoops, C.A.A. van Helvoirt, M.A. Verheijen, S. Karwal, A. Sharma, V. Beladiya, A. Szeghalmi, D.M. Hausmann, J. Henri, M. Creatore and W.M.M. (Erwin) Kessels
ACS Applied Materials & Interfaces
2018
10
13158
13180

10.1007/s10853-017-0855-6

Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor
Lukas Mai, Zivile Giedraityte, Marcel Schmidt, Detlef Rogalla, Sven Scholz, Andreas D. Wieck, Anjana Devi, Maarit Karppinen
Journal of Materials Science
2017
52
11
6216
6224

10.1088/1361-6463/aa59b3

The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges
M Napari, O Tarvainen, S Kinnunen, K Arstila, J Julin, Ø S Fjellvåg, K Weibye, O Nilsen and T Sajavaara
Journal of Physics D: Applied Physics
2017
50
95201

10.1021/acs.chemmater.7b03747

Suppressing the Thermal and Ultraviolet Sensitivity of Kevlar by Infiltration and Hybridization with ZnO
Itxasne Azpitarte, Ana Zuzuarregui, Hayrensa Ablat, Leire Ruiz-Rubio, Alberto López-Ortega, Simon D. Elliott, and Mato Knez
Chem. Mater.
2017
29
23
10068
10074

10.1116/1.5002634

Thermal study of an indium trisguanidinate as a possible indium nitride precursor
Sydney C Buttera, Karl Rönnby, Henrik Pedersen, Lars Ojamäe, Sean T Barry
Journal of Vacuum Science and Technology A
2018
36
1

10.1021/acs.jpcc.7b09538

Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition
Mewlude Imam, Laurent Souqui, Jan Herritsch, Andreas Stegmüller, Carina Höglund, Susann Schmidt, Richard Hall-Wilton, Hans Högberg, Jens Birch, Ralf Tonner, and Henrik Pedersen
Journal of Physical Chemistry C
2017

10.1002/admi.201700237

Reversible and Irreversible Reactions of Trimethylaluminum with Common Organic Functional Groups as a Model for Molecular Layer Deposition and Vapor Phase Infiltration
Fan Yang, Jens Brede, Hayrensa Ablat, Mikel Abadia, Lianbing Zhang, Celia Rogero, Simon D. Elliott, Mato Knez
Adv. Mater. Interfaces
2017
1700237

10.1021/acsami.6b12267

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Tahsin Faraz, Maarten van Drunen, Harm Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis Hausmann, Jon Henri, Erwin Kessels
ACS Applied Materials & Interfaces
2017
9
2
1858
1869

10.1116/1.4971389

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
Journal of Vacuum Science and Technology A
2017
35
10801

10.1016/j.apsusc.2016.01.216

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications
Maria Berdova, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila
Applied Surface Science
2016
368
470
476

10.1116/1.4961113

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition
Maria Berdova, Xuwen Liu, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Marco Fanciulli, Sami Franssila
Journal of Vacuum Science & Technology A
2016
34
5
51510

10.1021/acsami.5b06833

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
Harm C. M. Knoops, Eline M. J. Braeken, Koen de Peuter, Stephen E. Potts, Suvi Haukka, Viljami Pore, and Wilhelmus M. M. Kessels
ACS Appl. Mater. Interfaces
2015
7
35
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