Publications

The following publications were co-authored by at least two Action participants from two different countries participating in HERALD, where HERALD networking added value.

Displaying 19 publications

10.1021/acs.jpcc.9b03039

Intercalation of Lithium Ions from Gaseous Precursors into β-MnO2 Thin Films Deposited by Atomic Layer Deposition
H.-E. Nieminen, V. Miikkulainen, D. Settipani, L. Simonelli, P. Hönicke, C. Zech, Y. Kayser, B. Beckhoff, A.-P. Honkanen, M. J. Heikkilä, K. Mizohata, K. Meinander, O. M. E. Ylivaara, S. Huotari, M. Ritala
J. Phys. Chem. C
2019

10.3390/nano9010088

Fracture Mechanics and Oxygen Gas Barrier Properties of Al2O3/ZnO Nanolaminates on PET Deposited by Atomic Layer Deposition
Vipin Chawla, Mikko Ruoho, Matthieu Weber, Adib Abou Chaaya, Aidan A. Taylor, Christophe Charmette, Philippe Miele, Mikhael Bechelany, Johann Michler and Ivo Utke
Nanomaterials
2018
9
88
105

10.3762/bjnano.9.155

Sulfur-, nitrogen- and platinum-doped titania thin films with high catalytic efficiency under visible-light illumination
Boštjan Žener, Lev Matoh, Giorgio Carraro, Bojan Miljević and Romana Cerc Korošec
Beilstein J. Nanotechnol.
2018
9
1629
1640

10.1039/C8DT00723C

The transformation behaviour of “alucones”, deposited by molecular layer deposition, in nanoporous Al2O3 layers
Kevin Van de Kerckhove, Maïssa K. S. Barr, Lionel Santinacci, Philippe M. Vereecken, Jolien Dendooven and Christophe Detavernier
Dalton Trans.
2018
47
5860
5870

10.1039/c8nr06468g

Multi-functional MnO2 nanomaterials for photo-activated applications by a plasma-assisted fabrication route
Davide Barreca, Filippo Gri, Alberto Gasparotto, Giorgio Carraro, Lorenzo Bigiani, Thomas Altantzis, Boštjan Žener, Urška Lavrenčič Štangar, Bruno Al
Nanoscale
2019
11
98
108

10.1021/acsami.8b00183

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
T. Faraz, H.C.M. Knoops, C.A.A. van Helvoirt, M.A. Verheijen, S. Karwal, A. Sharma, V. Beladiya, A. Szeghalmi, D.M. Hausmann, J. Henri, M. Creatore and W.M.M. (Erwin) Kessels
ACS Applied Materials & Interfaces
2018
10
13158
13180

10.1007/s10853-017-0855-6

Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor
Lukas Mai, Zivile Giedraityte, Marcel Schmidt, Detlef Rogalla, Sven Scholz, Andreas D. Wieck, Anjana Devi, Maarit Karppinen
Journal of Materials Science
2017
52
11
6216
6224

10.1116/1.5002634

Thermal study of an indium trisguanidinate as a possible indium nitride precursor
Sydney C Buttera, Karl Rönnby, Henrik Pedersen, Lars Ojamäe, Sean T Barry
Journal of Vacuum Science and Technology A
2018
36
1

10.1021/acs.jpcc.7b09538

Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition
Mewlude Imam, Laurent Souqui, Jan Herritsch, Andreas Stegmüller, Carina Höglund, Susann Schmidt, Richard Hall-Wilton, Hans Högberg, Jens Birch, Ralf Tonner, and Henrik Pedersen
Journal of Physical Chemistry C
2017

10.1002/admi.201700237

Reversible and Irreversible Reactions of Trimethylaluminum with Common Organic Functional Groups as a Model for Molecular Layer Deposition and Vapor Phase Infiltration
Fan Yang, Jens Brede, Hayrensa Ablat, Mikel Abadia, Lianbing Zhang, Celia Rogero, Simon D. Elliott, Mato Knez
Adv. Mater. Interfaces
2017
1700237

10.1021/acsami.6b12267

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Tahsin Faraz, Maarten van Drunen, Harm Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis Hausmann, Jon Henri, Erwin Kessels
ACS Applied Materials & Interfaces
2017
9
2
1858
1869

10.1016/j.apsusc.2016.01.216

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications
Maria Berdova, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Luca Lamagna, Stefano Losa, Silvia Rossini, Roberto Somaschini, Salvatore Gioveni, Marco Fanciulli, Sami Franssila
Applied Surface Science
2016
368
470
476

10.1116/1.4961113

Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition
Maria Berdova, Xuwen Liu, Claudia Wiemer, Alessio Lamperti, Grazia Tallarida, Elena Cianci, Marco Fanciulli, Sami Franssila
Journal of Vacuum Science & Technology A
2016
34
5
51510

10.1021/acsami.5b06833

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
Harm C. M. Knoops, Eline M. J. Braeken, Koen de Peuter, Stephen E. Potts, Suvi Haukka, Viljami Pore, and Wilhelmus M. M. Kessels
ACS Appl. Mater. Interfaces
2015
7
35
19857
19862